Products Semiconductor / Diamond Substrates

Impurities:

Nitorogen concentration: less than 8ppm, B & Si : below SIMS resolution

Crystal orientation:

(100) with the off angle of 3°

Polishing:

Regular (Ra＜5nm), Fine (Ra＜2nm)

Size:

1 x 1 – 15 x 15mm, Thickness: 0.03 – 3mm

1. ① (110), (111) can be fabricated with length less than 3mm. Width can be selected (ex. 3 x 3mm, 6 x 3mm)
2. ② (100) Off angle: Between 0 and 5 degree toward selected direction

FWHM of X-ray locking curve can be selected. (ex. FWHM＜50arcsec, FWHM＜30arcsec)

Impurities:

1. Low N Substrate Nitrogen concentration: less than 0.5ppm, B & Si : below SIMS resolution

2. Standard Substrate Nitrogen concentration: less than 0.5ppm, B & Si : below SIMS resolution

Crystal orientation:

(111) with the off angle of 3°

Polishing:

Regular Ra<5nm

Size:

Length is less than 3mm, and width can be selected (ex. 3 x 3mm, 6 x 3mm)

Thickness:

0.2mm – 0.5mm

2×1020 – 4×1020/cm3

Less than 20mΩcm

0.2mm

Less than 13x13mm

Both face polished (Ra<5nm or Ra<2nm)

2×1020 – 4×1020/cm3

0.03 – 0.2 mm

(Polishing one face needs minimum 0.5mm thickness)

Single crystal less than 8x8mm, Mosaic crystal less than 18x18mm

Standard EDP substrate with thickness 0.3-0.5mm